Design and manufacture of optical system for use in ultraviolet lithography with the free-electron laser

Donald A. Byrd; Vriddhachalam K. Viswanathan; Gregg L. Woodfin; William W. Horn; Vito J. Lazazzera; Rodney A. Schmell

doi:10.1117/12.150634

13 August 1993 Design and manufacture of optical system for use in ultraviolet lithography with the free-electron laser

Donald A. Byrd, Vriddhachalam K. Viswanathan, Gregg L. Woodfin, William W. Horn, Vito J. Lazazzera, Rodney A. Schmell

Proceedings Volume 1868, Laser Resonators and Coherent Optics: Modeling, Technology, and Applications; (1993) https://doi.org/10.1117/12.150634
Event: OE/LASE'93: Optics, Electro-Optics, and Laser Applications in Scienceand Engineering, 1993, Los Angeles, CA, United States

Abstract

At Los Alamos National Laboratory, we are preparing to image submicrometer-size features using the Free Electron Laser (FEL) operating at 248 nm. This article describes the optical transfer systems that were designed to relay the ultraviolet (UV) optical output of the FEL, resulting in expected imaged feature sizes in the range 0.3 - 0.5 micrometers . Nearly all optical subsystems are reflective, and once the coatings were optimized any optical wavelength could be used. All refractive optics were UV-grade fused silica. The optical design, engineering, and manufacture of the various component systems are described along with some experimental results.

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Donald A. Byrd, Vriddhachalam K. Viswanathan, Gregg L. Woodfin, William W. Horn, Vito J. Lazazzera, and Rodney A. Schmell "Design and manufacture of optical system for use in ultraviolet lithography with the free-electron laser", Proc. SPIE 1868, Laser Resonators and Coherent Optics: Modeling, Technology, and Applications, (13 August 1993); https://doi.org/10.1117/12.150634

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