Paper
1 February 1994 Performance of laminar-etched multilayer amplitude grating used with a synchrotron beam
Philippe Troussel, S. Bac, Robert J. Barchewitz, A. Sammar, Daniel Schirmann, A. Mirone, Philippe Guerin
Author Affiliations +
Abstract
We give an experimental study of soft x-ray diffraction by various laminar multilayer amplitude grating mirrors made by electron beam lithography. The +1, 0, -1 diffraction order efficiencies in the grating rule scan model and their positions were measured using synchrotron radiation on the Super-Aco at L.U.R.E in the X-UV region, particularly above the silicon L edge. These efficiencies were compared with values obtained in the detector scan mode. Their diffraction pattern were analyzed and discussed with a model. We describe a modular X-UV spectrogoniometer (0 - 20 goniometer).
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philippe Troussel, S. Bac, Robert J. Barchewitz, A. Sammar, Daniel Schirmann, A. Mirone, and Philippe Guerin "Performance of laminar-etched multilayer amplitude grating used with a synchrotron beam", Proc. SPIE 2011, Multilayer and Grazing Incidence X-Ray/EUV Optics II, (1 February 1994); https://doi.org/10.1117/12.167217
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KEYWORDS
Diffraction gratings

Diffraction

Multilayers

Sensors

Mirrors

Electron beam lithography

Reflectivity

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