Ealing Schwarzschild microscope using 50 to 60 nm illumination from a laser plasma EUV source

Lan Sun; Gary A. Sweezey; William T. Silfvast

doi:10.1117/12.168013

1 February 1994 Ealing Schwarzschild microscope using 50-60-nm illumination from a laser plasma EUV source

Lan Sun, Gary A. Sweezey, William T. Silfvast

Proceedings Volume 2015, Applications of Laser Plasma Radiation; (1994) https://doi.org/10.1117/12.168013
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

The construction of an extreme ultraviolet reflection imaging microscope at CREOL using an Ealing Schwarzschild objective and a laser-produced plasma source is summarized. Proposed operation of the present system in the 50 - 60 nm wavelength region is discussed.

Citation Download Citation

Lan Sun, Gary A. Sweezey, and William T. Silfvast "Ealing Schwarzschild microscope using 50-60-nm illumination from a laser plasma EUV source", Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); https://doi.org/10.1117/12.168013

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