Manufacture of diffractive structures in metal and semiconductor thin films by pulse laser irradiation

Zoya N. Kalyashova; Vladimir E. Sabinin; V. I. Korolev; E. P. Mesnyankin

doi:10.1117/12.167553

1 February 1994 Manufacture of diffractive structures in metal and semiconductor thin films by pulse laser irradiation

Zoya N. Kalyashova, Vladimir E. Sabinin, V. I. Korolev, E. P. Mesnyankin

Proceedings Volume 2045, Laser-Assisted Fabrication of Thin Films and Microstructures; (1994) https://doi.org/10.1117/12.167553
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

The metal and semiconductor films (MSF), deposited on the glass and metal substrates, have been used as recording materials when fabricating diffraction gratings by pulse laser irradiation of 1.06 micrometers . The processes of photothermal ablation are the basis for mechanism of diffraction structure formation. The gratings at spatial frequencies of 100 and 500 mm^-1 have been fabricated without postexposure treatment by pulse laser irradiation of 20, 100 and 1000 ns in duration. It has been shown that dependence of threshold energy density E_thr from pulse duration (tau) is well approximated by function E_thrvaries direct as(root)(tau) . The relief-phase component of the grating's diffraction efficiency (DE) has been measured.

Citation Download Citation

Zoya N. Kalyashova, Vladimir E. Sabinin, V. I. Korolev, and E. P. Mesnyankin "Manufacture of diffractive structures in metal and semiconductor thin films by pulse laser irradiation", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167553

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