Metrology hardware simulation of mask focus-exposure matrix

Mircea V. Dusa; Guoqing Xiao; Erik H. Rauch

doi:10.1117/12.167257

15 February 1994 Metrology hardware simulation of mask focus-exposure matrix

Mircea V. Dusa, Guoqing Xiao, Erik H. Rauch

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167257
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

Previous studies described the Depth Resonance Function (DRF) capabilities to understand and control defocus effects of a CD metrology system. This paper discusses the important properties of the DRF and how these properties affect the linewidth metrology process for photomasks built for submicron lithography. The DRF is used to investigate how various metrology process parameters change the response of the CD metrology system. The response of the CD metrology system is then presented as `Focus-Illumination' curves. Such CD results are compared to typical Bossung F-E curves to determine to what extent the metrology Focus- Illumination curves can simulate mask aerial image degradation that occurs during normal stepper exposure process.

Citation Download Citation

Mircea V. Dusa, Guoqing Xiao, and Erik H. Rauch "Metrology hardware simulation of mask focus-exposure matrix", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167257

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Metrology

Critical dimension metrology

Image processing

Optical lithography

Confocal microscopy

Opacity

Show All Keywords

Keywords/Phrases

Search In:

Publication Years