Analog phase holograms by electron-beam lithography

Paul D. Maker; Richard E. Muller

doi:10.1117/12.187478

23 September 1994 Analog phase holograms by electron-beam lithography

Paul D. Maker, Richard E. Muller

Proceedings Volume 2267, Advanced Microdevices and Space Science Sensors; (1994) https://doi.org/10.1117/12.187478
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

Phase holograms have been created on the surface of a thin film of poly-methyl methacrylate (PMMA, Plexiglas) by direct-write electron beam (E-Beam) lithography. The process involves delivering a patterned exposure dose followed by partial development with a strong developer. The patterned dose derives from arbitrary computer-calculated holograms, which must be corrected for the sensitivity characteristic of the PMMA and for the effective point-spread function of the E-Beam.

Citation Download Citation

Paul D. Maker and Richard E. Muller "Analog phase holograms by electron-beam lithography", Proc. SPIE 2267, Advanced Microdevices and Space Science Sensors, (23 September 1994); https://doi.org/10.1117/12.187478

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