Paper
28 November 1994 Nonlinear optical properties of a C60 film at wavelengths between 720 and 880 nm
Friedrich P. Strohkendl, R. J. Larsen, Larry Raymond Dalton, Robert W. Hellwarth, H. W. Sarkas, Zakya H. Kafafi
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Abstract
We measure the magnitude and phase of both independent components of the femtosecond (fs) third-order nonlinear optical susceptibility tensor (chi) (3)(-(omega) ;(omega) ,(omega) ,-(omega) ) of a C60 film. We observe only the contribution of mechanisms whose rise and decay times are short compared to our 120 fs microjoule pulses. The value of (chi) 1111 varies between (6.39 +/- 0.35) X 10-13 esu at 745 nm and (19.7 +/- 1.1) X 10-13 esu at 875 nm, relative to fused silica, and rises monotonically with wavelength. Its phase angles lie between 100 and 150 degrees. Our results indicate that neither our, nor any previously published, measurements can be assumed to have approached the low frequency limit in C60.
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Friedrich P. Strohkendl, R. J. Larsen, Larry Raymond Dalton, Robert W. Hellwarth, H. W. Sarkas, and Zakya H. Kafafi "Nonlinear optical properties of a C60 film at wavelengths between 720 and 880 nm", Proc. SPIE 2284, Fullerenes and Photonics, (28 November 1994); https://doi.org/10.1117/12.196138
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KEYWORDS
Silica

Fullerenes

Photonics

Thin films

Polarization

Diffraction gratings

Femtosecond phenomena

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