Automatic optical proximity correction with optimization of stepper condition

Soichi Inoue; Tadahito Fujisawa; Satoshi Tanaka; Shoji Mimotogi; Akiko Nikki; Ichiro Mori

doi:10.1117/12.209255

26 May 1995 Automatic optical proximity correction with optimization of stepper condition

Soichi Inoue, Tadahito Fujisawa, Satoshi Tanaka, Shoji Mimotogi, Akiko Nikki, Ichiro Mori

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209255
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

A simulated annealing, one of the optimization algorithms, has been applied to the optical proximity correction. Using attenuating phase shifting mask with annular illumination, the stepper condition as well as mask design has been optimized to correct line shortening for typical cell array pattern of dynamic random access memory. A cost function has been designed to reflect the desired dose-window and depth of focus obtained by ED-tree analysis. The performances of escape from a local minimum and the convergency have been demonstrated. Then all parameters that dominated the optical proximity effect have been optimized to minimize the cost function under practical constraints.

Citation Download Citation

Soichi Inoue, Tadahito Fujisawa, Satoshi Tanaka, Shoji Mimotogi, Akiko Nikki, and Ichiro Mori "Automatic optical proximity correction with optimization of stepper condition", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209255

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