Comparison of semiconductor technologies used in display fabrication

Joseph G. Razo

doi:10.1117/12.210981

5 June 1995 Comparison of semiconductor technologies used in display fabrication

Joseph G. Razo

Proceedings Volume 2462, Cockpit Displays II; (1995) https://doi.org/10.1117/12.210981
Event: SPIE's 1995 Symposium on OE/Aerospace Sensing and Dual Use Photonics, 1995, Orlando, FL, United States

Abstract

There are a number of semiconductor materials that have been brought to bear on the display market. Several technologies are actively being pursued to fabricate active matrix liquid crystal displays, including Amorphous silicon (a-Si), Polysilicon (p-Si), Single Crystal silicon (x- Si), and Cadmium Selenide (CdSe). A comparison is made between the various technologies to assess their relative suitability for avionics displays.

Citation Download Citation

Joseph G. Razo "Comparison of semiconductor technologies used in display fabrication", Proc. SPIE 2462, Cockpit Displays II, (5 June 1995); https://doi.org/10.1117/12.210981

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available