Characterization techniques for x-ray lithography sources

Juan R. Maldonado; Peter M. Celliers

doi:10.1117/12.240494

27 May 1996 Characterization techniques for x-ray lithography sources

Juan R. Maldonado, Peter M. Celliers

Proceedings Volume 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI; (1996) https://doi.org/10.1117/12.240494
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Simple measurements techniques for evaluation of x-ray lithography sources are presented in this paper. Experimental results obtained with this simple method in a point source x-ray system consisting of a Cu target irradiated by a Nd:glass laser agree with complete calculations performed taking into account the spectrum from the x-ray source measured with calibrated crystal and CCD detectors.

Citation Download Citation

Juan R. Maldonado and Peter M. Celliers "Characterization techniques for x-ray lithography sources", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240494

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