High-throughput process optimization using the EZ technique

Medhat A. Toukhy; Karin R. Schlicht; Patricia Morra; Somboun Chanthalyma

doi:10.1117/12.241863

14 June 1996 High-throughput process optimization using the EZ technique

Medhat A. Toukhy, Karin R. Schlicht, Patricia Morra, Somboun Chanthalyma

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241863
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The greatest advantage of the EZ method is that it provides a simple, rapid and reliable technique to screen and evaluate the lithographic process. Thorough lithographic and dissolution rate examination can be performed for only the final selections of resist materials and process.

Citation Download Citation

Medhat A. Toukhy, Karin R. Schlicht, Patricia Morra, and Somboun Chanthalyma "High-throughput process optimization using the EZ technique", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241863

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