Study of the influence of nonuniform pupils in photolithographic systems through the apparent transfer function

Maria Josefa Yzuel; Rosemarie Hild; Juan Carlos Campos Rubio; Juan C. Escalera

doi:10.1117/12.246680

23 August 1996 Study of the influence of nonuniform pupils in photolithographic systems through the apparent transfer function

Maria Josefa Yzuel, Rosemarie Hild, Juan Carlos Campos Rubio, Juan C. Escalera

Author Affiliations +

Proceedings Volume 2774, Design and Engineering of Optical Systems; (1996) https://doi.org/10.1117/12.246680
Event: Optical Instrumentation and Systems Design, 1996, Glasgow, United Kingdom

Abstract

We have studied nonuniform transmission filters to improve resolution and/or Depth of Focus in lithography. To understand the transmission behavior of these filters for periodic structures we discuss the Apparent Transfer Function in dependence on the defocus. We use the Apparent Transfer Function that is defined by the contrast of the corresponding spatial frequencies, and we analyze the behavior of the system for coherent, incoherent and partially coherent illumination.

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Maria Josefa Yzuel, Rosemarie Hild, Juan Carlos Campos Rubio, and Juan C. Escalera "Study of the influence of nonuniform pupils in photolithographic systems through the apparent transfer function", Proc. SPIE 2774, Design and Engineering of Optical Systems, (23 August 1996); https://doi.org/10.1117/12.246680

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