Deposition of conventional and gradient optical coatings by ECR plasma-enhanced chemical vapor deposition

Pavel V. Bulkin; Pieter L. Swart; Beatrys M. Lacquet; Anatoli A. Chtcherbakov

doi:10.1117/12.246840

19 August 1996 Deposition of conventional and gradient optical coatings by ECR plasma-enhanced chemical vapor deposition

Pavel V. Bulkin, Pieter L. Swart, Beatrys M. Lacquet, Anatoli A. Chtcherbakov

Author Affiliations +

Proceedings Volume 2776, Developments in Optical Component Coatings; (1996) https://doi.org/10.1117/12.246840
Event: Optical Instrumentation and Systems Design, 1996, Glasgow, United Kingdom

Abstract

The computer-controlled electron cyclotron resonance plasma enhanced chemical vapor deposition of SiO_xN_y was used for the manufacturing of optical interference coatings with inhomogeneous and traditional multilayer refractive index profiles. Such complex structures as triple-band rugate optical interference filters and graded refractive index antireflection coatings were grown. The design of coatings was performed using measured optical constants of the SiO_xN_y-system.

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Pavel V. Bulkin, Pieter L. Swart, Beatrys M. Lacquet, and Anatoli A. Chtcherbakov "Deposition of conventional and gradient optical coatings by ECR plasma-enhanced chemical vapor deposition", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); https://doi.org/10.1117/12.246840

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