Infrared reflection polarizers using uniform and diffuse low-index layers buried in high-index substrates

Rasheed M. A. Azzam; Mostofa M. K. Howlader

doi:10.1117/12.246204

16 August 1996 Infrared reflection polarizers using uniform and diffuse low-index layers buried in high-index substrates

Rasheed M. A. Azzam, Mostofa M. K. Howlader

Author Affiliations +

Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246204
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan

Abstract

The extinction ratio ER and the reflectance, or throughput, for the unextinguished s polarization R_s are calculated for infrared reflection polarizers that consist of a low- index transparent layer embedded in a high-index transparent substrate. Iso-ER and iso-R_s contours illustrate the dependence of the ER and R_s for a specific IR polarizer on the depth and width of a buried layer of SiO₂ in Si at 3.5-micrometers wavelength and 80 degree(s) angle of incidence. Both cases of a uniform layer with sharp boundaries and a diffuse Gaussian layer are considered. The diffuse-layer model employs Bruggeman's effective medium theory and is intended to simulate devices that are fabricated by the oxygen-ion implantation of Si. The angular and wavelength sensitivities of these polarizers are determined.

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Rasheed M. A. Azzam and Mostofa M. K. Howlader "Infrared reflection polarizers using uniform and diffuse low-index layers buried in high-index substrates", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246204

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