Potential of e-beam writing for diffractive optics

Ernst-Bernhard Kley; Frank Wyrowski

doi:10.1117/12.274413

15 May 1997 Potential of e-beam writing for diffractive optics

Ernst-Bernhard Kley, Frank Wyrowski

Proceedings Volume 3010, Diffractive and Holographic Device Technologies and Applications IV; (1997) https://doi.org/10.1117/12.274413
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

E-beam lithography (EBL) is a powerful tool in optics. Optician can use the progress in EBL to fabricate optical components and systems with novel functions. However, EBL is dominated by microelectronics. Therefore the demands of optics are not always met by the exiting EBL technology. Some possibilities as well as limits of EBL in optics are discussed at the example of diffractive optics.

Citation Download Citation

Ernst-Bernhard Kley and Frank Wyrowski "Potential of e-beam writing for diffractive optics", Proc. SPIE 3010, Diffractive and Holographic Device Technologies and Applications IV, (15 May 1997); https://doi.org/10.1117/12.274413

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