Photoresist materials: a historical perspective

C. Grant Willson; Ralph R. Dammel; Arnost Reiser

doi:10.1117/12.275921

7 July 1997 Photoresist materials: a historical perspective

C. Grant Willson, Ralph R. Dammel, Arnost Reiser

Proceedings Volume 3050, Metrology, Inspection, and Process Control for Microlithography XI; (1997) https://doi.org/10.1117/12.275921
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

This paper provides a short history of the development of resist materials. We trace the development of resists form the very beginnings of photography in the early 1800's to today's efforts to develop 193nm resist materials.

Citation Download Citation

C. Grant Willson, Ralph R. Dammel, and Arnost Reiser "Photoresist materials: a historical perspective", Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); https://doi.org/10.1117/12.275921

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available