Influence of optical nonlinearities of the photoresist on the photolithographic process: basics

Andreas Erdmann; Clifford L. Henderson; C. Grant Willson; Wolfgang Henke

doi:10.1117/12.276032

7 July 1997 Influence of optical nonlinearities of the photoresist on the photolithographic process: basics

Andreas Erdmann, Clifford L. Henderson, C. Grant Willson, Wolfgang Henke

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276032
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Several commercial photoresists are characterized with respect to their changes of the real part of the refractive index during the bleaching process. A finite difference beam propagation algorithm is used to evaluate the impact of these refractive index changes on the lithographic process. It is shown, that the refractive index changes result in modified process windows, side wall angles, swing curves and iso/dense behavior.

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Andreas Erdmann, Clifford L. Henderson, C. Grant Willson, and Wolfgang Henke "Influence of optical nonlinearities of the photoresist on the photolithographic process: basics", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276032

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