Thick silicate glass film for a waveguide

Masayuki Yamane; Shuichi Shibata; Tetsuji Yano; Kenichi Watanabe

doi:10.1117/12.284118

2 October 1997 Thick silicate glass film for a waveguide

Masayuki Yamane, Shuichi Shibata, Tetsuji Yano, Kenichi Watanabe

Proceedings Volume 3136, Sol-Gel Optics IV; (1997) https://doi.org/10.1117/12.284118
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

The formation of a borosilicate glass film of 10 - 20 micrometers in thickness on a silicon substrate via an interfacial polymerization technique has been studied as the first step for the preparation of a planer waveguide for optical communication. A gel film prepared from the partially hydrolyzed TMOS mixed with boron alkoxides could be densified into a glass film of 16 micrometer in thickness having a smooth surface by the heat treatment up to 1000 degrees Celsius. A good reproducibility in the yield was obtained by completing the hydrolysis and condensation of the whole ingredient in the 5 ml of precursor solution spread over water containing triethylamine as a catalyst within a cylindrical container of about 80 mm inside diameter. The use of saturated aqueous solution of boric acid instead of distilled water was necessary to hinder the re-dissolution of boron from the formed gel film.

Citation Download Citation

Masayuki Yamane, Shuichi Shibata, Tetsuji Yano, and Kenichi Watanabe "Thick silicate glass film for a waveguide", Proc. SPIE 3136, Sol-Gel Optics IV, (2 October 1997); https://doi.org/10.1117/12.284118

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