Advanced pulsed laser deposition method (eclipse angle)

Minoru Tachiki; Eiichi Morita; Kenji Yamada; Xiaodong Fang; Takeshi Kobayashi

doi:10.1117/12.300700

20 February 1998 Advanced pulsed laser deposition method (eclipse angle)

Minoru Tachiki, Eiichi Morita, Kenji Yamada, Xiaodong Fang, Takeshi Kobayashi

Proceedings Volume 3175, Third International Conference on Thin Film Physics and Applications; (1998) https://doi.org/10.1117/12.300700
Event: Third International Conference on Thin Film Physics and Applications, 1997, Shanghai, China

Abstract

In spite of the advantage of droplet reduction in the pulsed laser deposition (PLD) process, eclipse PLD method has some drawbacks that activated growth species are also shielded by the shadow mask, and deposition rate decreases in low ambient pressure condition. In this study, we proposed new composite shadow mask method named 'eclipse angel PLD method' to overcome this problem. We directly observed the emitting plume propagating through the ring-mask structure and reaching the substrate by the ultra fast camera, and confirmed growth rate enhancement of YBa₂Cu₃O_x thin films in low ambient oxygen pressure region. Also, did we the effects of Ar addition when are of favor to improve the film qualities of Bi-layered crystals.

Citation Download Citation

Minoru Tachiki, Eiichi Morita, Kenji Yamada, Xiaodong Fang, and Takeshi Kobayashi "Advanced pulsed laser deposition method (eclipse angle)", Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); https://doi.org/10.1117/12.300700

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