Development of a laser holographic interference system for optical grating fabrication

Feng-Lan Xu; Yee Loy Lam; Yuen Chuen Chan; Yan Zhou

doi:10.1117/12.284034

18 August 1997 Development of a laser holographic interference system for optical grating fabrication

Feng-Lan Xu, Yee Loy Lam, Yuen Chuen Chan, Yan Zhou

Proceedings Volume 3185, Automatic Inspection and Novel Instrumentation; (1997) https://doi.org/10.1117/12.284034
Event: ISMA '97 International Symposium on Microelectronics and Assembly, 1997, Singapore, Singapore

Abstract

Periodic corrugations in the form of gratings are an important component in integrated optical devices. In most cases, the period of the corrugations required is of the order of a micron or less and hence conventional photolithography could not be applied. In this paper, we discuss the development of a holographic interference exposure system based on a He-Cd laser of wavelength 325 nm. The laser light is kept as one beam as it transverses through the various optics. Upon incidence on the exposure assembly, the wavefront reflected from a mirror and that incident directly onto the photoresist-coated sample will interfere to generate the required interference pattern on the sample. Gratings with periods of 320 nm to 1.69 micrometers have been fabricated on positive photoresist-coated silicon samples. The periods were analyzed by both Atomic Force Microscopy and optical diffraction measurements. The periodic patterns have also been transferred onto glass substrates via etching. The measured grating periods are in good agreement with the designed values.

Citation Download Citation

Feng-Lan Xu, Yee Loy Lam, Yuen Chuen Chan, and Yan Zhou "Development of a laser holographic interference system for optical grating fabrication", Proc. SPIE 3185, Automatic Inspection and Novel Instrumentation, (18 August 1997); https://doi.org/10.1117/12.284034

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