10-um thin GaAs membrane manufactured by nonselective etching

Alexandru Mueller; Ioana Petrini; Viorel Avramescu; Sergiu A. Iordanescu; Romolo Marcelli; Vittorio Foglietti; M. Dragoman

doi:10.1117/12.284482

5 September 1997 10-um thin GaAs membrane manufactured by nonselective etching

Alexandru Mueller, Ioana Petrini, Viorel Avramescu, Sergiu A. Iordanescu, Romolo Marcelli, Vittorio Foglietti, M. Dragoman

Author Affiliations +

Proceedings Volume 3223, Micromachining and Microfabrication Process Technology III; (1997) https://doi.org/10.1117/12.284482
Event: Micromachining and Microfabrication, 1997, Austin, TX, United States

Abstract

The aim of this paper is to determine an optimum nonselective etching solution in order to manufacture an as thin as possible, uniform and high quality GaAs membrane. Three different etching systems in various proportions of the components were analyzed. A high quality 10 micrometer thin GaAs membrane was obtained using the [1(H₃PO₄)]: [1(CH₃OH)]: [3(H₂O₂)] etching solution. The micromachined GaAs membranes are manufactured to be used as support for microwave circuits as well as in high temperature sensor applications.

Citation Download Citation

Alexandru Mueller, Ioana Petrini, Viorel Avramescu, Sergiu A. Iordanescu, Romolo Marcelli, Vittorio Foglietti, and M. Dragoman "10-um thin GaAs membrane manufactured by nonselective etching", Proc. SPIE 3223, Micromachining and Microfabrication Process Technology III, (5 September 1997); https://doi.org/10.1117/12.284482

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