Random polarization control plate used to improve the illumination uniformity in ICF

Zhongyong Liu; Hua Zhang; Dianyuan Fan

doi:10.1117/12.311911

24 June 1998 Random polarization control plate used to improve the illumination uniformity in ICF

Zhongyong Liu, Hua Zhang, Dianyuan Fan

Proceedings Volume 3264, High-Power Lasers; (1998) https://doi.org/10.1117/12.311911
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

We propose the random polarization control plate (RPCP) to improve the illumination uniformity in ICF. The theoretical simulations show that the statistical characteristics of the intensity distribution created by use of the RPCP is greatly similar to that by use of combination technique of the polarization control plate (PCP) and random phase plate (RPP). This RPCP system employs only one element (RPCP), however, the combination of PCP and RPP uses two elements (PCP and RPP). Therefore this novel technique in this paper has some advantages compared with the combination technique, such as higher utilization ratio of laser energy, lower cost, easier fabrication and adjustment etc. and may become one alternative of the combination approach.

Citation Download Citation

Zhongyong Liu, Hua Zhang, and Dianyuan Fan "Random polarization control plate used to improve the illumination uniformity in ICF", Proc. SPIE 3264, High-Power Lasers, (24 June 1998); https://doi.org/10.1117/12.311911

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