Sources For The Production And Spectral Control Of Deep Ultraviolet Radiation

Jerry Bachur

doi:10.1117/12.933411

30 June 1982 Sources For The Production And Spectral Control Of Deep Ultraviolet Radiation

Jerry Bachur

Proceedings Volume 0333, Submicron Lithography I; (1982) https://doi.org/10.1117/12.933411
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

Multi-level resist technology is rapidly emerging as a technique capable of significantly improving processes needed to achieve desired yields on VLSI products. For the multi-level resist technology to be successful, production-rated Deep Ultraviolet (DUV) exposure systems will be required.

Citation Download Citation

Jerry Bachur "Sources For The Production And Spectral Control Of Deep Ultraviolet Radiation", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); https://doi.org/10.1117/12.933411

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