Three-aspherical-mirror system for EUV lithography

Hiroo Kinoshita; Takeo Watanabe; Masahito Niibe; Masaaki Ito; H. Oizumi; Hiromasa Yamanashi; Katsuhiko Murakami; Tetsuya Oshino; Yuriy Ya. Platonov; Nicola Grupido

doi:10.1117/12.309580

5 June 1998 Three-aspherical-mirror system for EUV lithography

Hiroo Kinoshita, Takeo Watanabe, Masahito Niibe, Masaaki Ito, H. Oizumi, Hiromasa Yamanashi, Katsuhiko Murakami, Tetsuya Oshino, Yuriy Ya. Platonov, Nicola Grupido

Author Affiliations +

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309580
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

In order to investigate industrial applications of synchrotron radiation, Hyogo Prefecture is constructing a synchrotron radiation (SR) ring at the SPring-8 site. It will operate at an electron energy of 1.5 GeV. In September, 1998, the ring will be commissioned when the SPring-8 injector begins feeding electrons into it. We developed a beam line for EUVL under the industrial applications program. In addition, we are developing a three-spherical- mirror system for EUVL. The specifications of the exposure tool target the 0.1-micrometers generation on the SIA road map. This tool consists of illumination optics, a scanning and alignment mechanism, 3-aspherical-mirror optics, and a load- lock chamber for exchanging wafers. The exposure tool is installed in a thermal chamber located at the end of the beamline. Using this system, we plan to develop a 0.1-micrometers process and fabricate MOS devices with feature sizes of 0.1- micrometers and below.

Citation Download Citation

Hiroo Kinoshita, Takeo Watanabe, Masahito Niibe, Masaaki Ito, H. Oizumi, Hiromasa Yamanashi, Katsuhiko Murakami, Tetsuya Oshino, Yuriy Ya. Platonov, and Nicola Grupido "Three-aspherical-mirror system for EUV lithography", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309580

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