Paper
8 December 1998 Double expansion of wavefront deformation in Zernike polynomials over the pupil and the field of view of optical systems: lens design, testing, and alignment
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Abstract
The double expansion of wavefront deformation in Zernike polynomials over the pupil and the field-of-view is a promising approach for lens design, testing, and alignment. Conventional wavefront representation in Zernike polynomial expansion from the pupil coordinates makes it very cumbersome to consider the optical system condition over the field-of- view. Evaluating the properties of symmetry of centered and perturbed systems can provide a compact representation of wavefront deformation over the field-of-view. Even for complicated optical systems such as lithography objectives, 8 to 12 global coefficients can provide a comprehensive system description. Coefficients for centered and perturbed systems are independent.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Il'ya P. Agurok "Double expansion of wavefront deformation in Zernike polynomials over the pupil and the field of view of optical systems: lens design, testing, and alignment", Proc. SPIE 3430, Novel Optical Systems and Large-Aperture Imaging, (8 December 1998); https://doi.org/10.1117/12.332493
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Cited by 12 scholarly publications.
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KEYWORDS
Wavefronts

Monochromatic aberrations

Zernike polynomials

Objectives

Lens design

Optical alignment

Mirrors

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