Design and fabrication of 256x256 diffractive microlens arrays on Si substrates

Yi Li; Xinjian Yi; Jianhua Hao

doi:10.1117/12.318293

5 August 1998 Design and fabrication of 256x256 diffractive microlens arrays on Si substrates

Yi Li, Xinjian Yi, Jianhua Hao

Proceedings Volume 3557, Current Developments in Optical Elements and Manufacturing; (1998) https://doi.org/10.1117/12.318293
Event: Photonics China '98, 1998, Beijing, China

Abstract

256 X 256 diffractive microlens arrays have been designed by considering the independent optical and processing parameters for 3 - 5 micrometers wavelength with a microlens size of 100 micrometers . The lens F number and array pitch are 1.5 and 100 micrometers , respectively. The diffractive microlens arrays have been fabricated on the surface of Si substrates by successive photolithography and Ar⁺ ion-beam-etching technique. The practical processes and fabrication method are discussed. The optical characteristics and measurements of the diffractive microlens arrays are presented.

Citation Download Citation

Yi Li, Xinjian Yi, and Jianhua Hao "Design and fabrication of 256x256 diffractive microlens arrays on Si substrates", Proc. SPIE 3557, Current Developments in Optical Elements and Manufacturing, (5 August 1998); https://doi.org/10.1117/12.318293

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