Process of pulsed-laser deposition of BaTiO3 ferroelectric thin films for device applications

Totka D. Kabadjova; Peter A. Atanasov; Rumen I. Tomov; Alexander N. Zherikhin; Dmitre G. Ouzounov

doi:10.1117/12.347650

7 May 1999 Process of pulsed-laser deposition of BaTiO₃ ferroelectric thin films for device applications

Totka D. Kabadjova, Peter A. Atanasov, Rumen I. Tomov, Alexander N. Zherikhin, Dmitre G. Ouzounov

Proceedings Volume 3571, Tenth International School on Quantum Electronics: Laser Physics and Applications; (1999) https://doi.org/10.1117/12.347650
Event: 10th International School on Quantum Electronics: Lasers: Physics and Applications, 1998, Varna, Bulgaria

Abstract

Thin films of BaTiO₃ were deposited by KrF excimer laser ablation (248 nm) on Si substrates at different substrate temperatures and various oxygen pressures. The process of ablation of the ceramic BaTiO₃ targets were investigated. The composition was measured by EDX microanalysis. The morphology and optical properties of the films were analyzed by SEM and ellipsometry respectively. The dielectric constant was estimated by LCR meter.

Citation Download Citation

Totka D. Kabadjova, Peter A. Atanasov, Rumen I. Tomov, Alexander N. Zherikhin, and Dmitre G. Ouzounov "Process of pulsed-laser deposition of BaTiO₃ ferroelectric thin films for device applications", Proc. SPIE 3571, Tenth International School on Quantum Electronics: Laser Physics and Applications, (7 May 1999); https://doi.org/10.1117/12.347650

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