Direct comparison of EUV and visible-light interferometries

Kenneth A. Goldberg; Patrick P. Naulleau; Sang Hun Lee; Chang-Hasnain C. Chang; Cynthia J. Bresloff; Richard J. Gaughan; Henry N. Chapman; John E. M. Goldsmith; Jeffrey Bokor

doi:10.1117/12.351138

25 June 1999 Direct comparison of EUV and visible-light interferometries

Kenneth A. Goldberg, Patrick P. Naulleau, Sang Hun Lee, Chang-Hasnain C. Chang, Cynthia J. Bresloff, Richard J. Gaughan, Henry N. Chapman, John E. M. Goldsmith, Jeffrey Bokor

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351138
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Recent experiments with four 10x EUV imaging systems provide the first direct comparisons of visible-light and at- wavelength EUV interferometers performed using the state-of- the-art measurement tools that will be used to assemble and align the next generation of EUV imaging systems. Measurements from four individual multilayer-coated Schwarzschild objectives are discussed. Favorable agreement has been achieved between EUV and visible-light system wavefront measurements in all four optical systems. Measurements made in the presence of surface contamination and multilayer thickness variation, however, do show expected localized differences between the two measurements.

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Kenneth A. Goldberg, Patrick P. Naulleau, Sang Hun Lee, Chang-Hasnain C. Chang, Cynthia J. Bresloff, Richard J. Gaughan, Henry N. Chapman, John E. M. Goldsmith, and Jeffrey Bokor "Direct comparison of EUV and visible-light interferometries", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351138

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