Low-temperature technique for thick film resist stabilization and curing

Jason P. Minter; Selmer S. Wong; Trey Marlowe; Matthew F. Ross; Mark E. Narcy; William R. Livesay

doi:10.1117/12.350163

11 June 1999 Low-temperature technique for thick film resist stabilization and curing

Jason P. Minter, Selmer S. Wong, Trey Marlowe, Matthew F. Ross, Mark E. Narcy, William R. Livesay

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350163
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

For a range of thick film photoresist applications, including MeV ion implant processing, thin film head manufacturing, and microelectromechanical systems processing, there is a need for a low-temperature method for resist stabilization and curing. Traditional methods of stabilizing or curing resist films have relied on thermal cycling, which may not be desirable due to device temperature limitations or thermally-induced distortion of the resist features.

Citation Download Citation

Jason P. Minter, Selmer S. Wong, Trey Marlowe, Matthew F. Ross, Mark E. Narcy, and William R. Livesay "Low-temperature technique for thick film resist stabilization and curing", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350163

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