New generation of very high repetition rate subnanosecond pulsed UV sources

F. Druon; Francois Balembois; Patrick M. Georges; Alain Brun

doi:10.1117/12.354739

19 July 1999 New generation of very high repetition rate subnanosecond pulsed UV sources

F. Druon, Francois Balembois, Patrick M. Georges, Alain Brun

Proceedings Volume 3749, 18th Congress of the International Commission for Optics; (1999) https://doi.org/10.1117/12.354739
Event: ICO XVIII 18th Congress of the International Commission for Optics, 1999, San Francisco, CA, United States

Abstract

We demonstrate a new kind of picosecond laser source in the UV at high repetition rate. This system is based on only passive, compact and simple elements: a microchip laser and a very efficient multipass amplifier both pumped with recently developed high brightness laser diodes. This all- solid-state laser has been optimized for delivering, at a high repetition rate -45 kHz-, sub-nanosecond pulses at the wavelength of 355 nm with an energy per pulse close to 1 (mu) J (or equivalently 38 mW average power). This source is- -to our knowledge--the first totally passive, 300-ps UV laser source at this high repetition rate.

Citation Download Citation

F. Druon, Francois Balembois, Patrick M. Georges, and Alain Brun "New generation of very high repetition rate subnanosecond pulsed UV sources", Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); https://doi.org/10.1117/12.354739

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