High-power source and illumination system for extreme ultraviolet lithography

Glenn D. Kubiak; Luis J. Bernardez II; Kevin D. Krenz; William C. Replogle; William C. Sweatt; Donald W. Sweeney; Russell M. Hudyma; Harry Shields

doi:10.1117/12.371111

23 November 1999 High-power source and illumination system for extreme ultraviolet lithography

Glenn D. Kubiak, Luis J. Bernardez II, Kevin D. Krenz, William C. Replogle, William C. Sweatt, Donald W. Sweeney, Russell M. Hudyma, Harry Shields

Author Affiliations +

Proceedings Volume 3767, EUV, X-Ray, and Neutron Optics and Sources; (1999) https://doi.org/10.1117/12.371111
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

A clean, high-power Extreme Ultraviolet (EUV) light source is being developed for Extreme Ultraviolet Lithography (EUVL). The source is based on a continuous jet of condensable gas irradiated with a diode-pumped solid state laser producing a time-averaged output power of 1700 W at 5000 - 6000 Hz. An illumination system is being assembled to collect and deliver the EUV output from the source and deliver it to a reticle and projection optics box to achieve an EUV exposure rate equivalent to ten 300-mm wafers per hour.

Citation Download Citation

Glenn D. Kubiak, Luis J. Bernardez II, Kevin D. Krenz, William C. Replogle, William C. Sweatt, Donald W. Sweeney, Russell M. Hudyma, and Harry Shields "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); https://doi.org/10.1117/12.371111

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