Microlens arrays based on chalcogenide glass resists using the proximity microlithography method

Salman Noach; M. Manevich; Matvei Klebanov; Victor Lyubin; Naftali Paul Eisenberg

doi:10.1117/12.363753

17 September 1999 Microlens arrays based on chalcogenide glass resists using the proximity microlithography method

Salman Noach, M. Manevich, Matvei Klebanov, Victor Lyubin, Naftali Paul Eisenberg

Proceedings Volume 3778, Gradient Index, Miniature, and Diffractive Optical Systems; (1999) https://doi.org/10.1117/12.363753
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

A simple microlens array fabrication process based on chalcogenide glass As-Se and As-S photoresists is described. Specific properties of chalcogenide photoresists important for microlenses preparation and the parameters of fabricated spherical and cylindrical microlens arrays are measured and discussed.

Citation Download Citation

Salman Noach, M. Manevich, Matvei Klebanov, Victor Lyubin, and Naftali Paul Eisenberg "Microlens arrays based on chalcogenide glass resists using the proximity microlithography method", Proc. SPIE 3778, Gradient Index, Miniature, and Diffractive Optical Systems, (17 September 1999); https://doi.org/10.1117/12.363753

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