Continuous sampling air-ICP for metals emission monitoring

David P. Baldwin; Daniel S. Zamzow; David E. Eckels; George P. Miller

doi:10.1117/12.372855

21 December 1999 Continuous sampling air-ICP for metals emission monitoring

David P. Baldwin, Daniel S. Zamzow, David E. Eckels, George P. Miller

Proceedings Volume 3853, Environmental Monitoring and Remediation Technologies II; (1999) https://doi.org/10.1117/12.372855
Event: Photonics East '99, 1999, Boston, MA, United States

Abstract

An air-inductively coupled plasma (air-ICP) system has been developed for continuous sampling and monitoring of metals as a continuous emission monitor (CEM). The plasma is contained in a metal enclosure to allow reduced-pressure operation. The enclosure and plasma are operated at a pressure slightly less than atmospheric using a Roots blower, so that sample gas is continuously drawn into the plasma. A Teflon sampling chamber, equipped with a sampling pump, is connected to the stack that is to be monitored to isokinetically sample gas from the exhaust line and introduce the sample into the air-ICP. Optical emission from metals in the sampled gas stream is detected and monitored using an acousto-optic tunable filter (AOTF)-echelle spectrometer system. A description of the continuous sampling air-ICP system is given, along with some preliminary laboratory data for continuous monitoring of metals.

Citation Download Citation

David P. Baldwin, Daniel S. Zamzow, David E. Eckels, and George P. Miller "Continuous sampling air-ICP for metals emission monitoring", Proc. SPIE 3853, Environmental Monitoring and Remediation Technologies II, (21 December 1999); https://doi.org/10.1117/12.372855

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