Model of photochromic mask layer for optical storage

Yi Zhang; Duanyi Xu; Longfa Pan

doi:10.1117/12.997586

28 June 1999 Model of photochromic mask layer for optical storage

Yi Zhang, Duanyi Xu, Longfa Pan

Proceedings Volume 3864, Joint International Symposium on Optical Memory and Optical Data Storage 1999; 38641C (1999) https://doi.org/10.1117/12.997586
Event: Optical Data Storage, 1999, Kauai, HI, United States

Abstract

With the development of the computer science and multimedia technology, high-density and high-speed storage media is demanded.

Citation Download Citation

Yi Zhang, Duanyi Xu, and Longfa Pan "Model of photochromic mask layer for optical storage", Proc. SPIE 3864, Joint International Symposium on Optical Memory and Optical Data Storage 1999, 38641C (28 June 1999); https://doi.org/10.1117/12.997586

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