High-resolution ultraviolet defect inspection of DAP (darkfield alternate phase) reticles

Lars W. Liebmann; Scott M. Mansfield; Alfred K. K. Wong; Jacek G. Smolinski; Song Peng; Kurt R. Kimmel; Maciej W. Rudzinski; James N. Wiley; Larry S. Zurbrick

doi:10.1117/12.373310

30 December 1999 High-resolution ultraviolet defect inspection of DAP (darkfield alternate phase) reticles

Lars W. Liebmann, Scott M. Mansfield, Alfred K. K. Wong, Jacek G. Smolinski, Song Peng, Kurt R. Kimmel, Maciej W. Rudzinski, James N. Wiley, Larry S. Zurbrick

Author Affiliations +

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373310
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

The manufacturing implementation of alternating aperture PSM's (AltPSM) has been gated by the impacts these techniques have on reticle manufacturing, specifically reticle defect inspection and repair. Die-to-die inspection techniques have been achieved for some clearfield multiphase alternate phase reticles, but the required die-to-database solutions are not currently available with defect inspection systems. In response to these mask manufacturing issues and IC design layout issues, resolution enhancing techniques based on Darkfield Alternate Phase (DAP) reticle designs are now of growing importance. A DAP Programmed Evaluation Reticle, DAPPER, was fabricated and inspected on a new high numerical aperture ultraviolet reticle inspection system. The results show reasonable defect sensitivity performance in the presence of both reticle geometry and quartz etch topography characteristic of 130-nm node advanced logic circuit DAP reticles.

Citation Download Citation

Lars W. Liebmann, Scott M. Mansfield, Alfred K. K. Wong, Jacek G. Smolinski, Song Peng, Kurt R. Kimmel, Maciej W. Rudzinski, James N. Wiley, and Larry S. Zurbrick "High-resolution ultraviolet defect inspection of DAP (darkfield alternate phase) reticles", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373310

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available