Image size control in next generation lithography masks

Michael J. Lercel; Christopher Magg

doi:10.1117/12.390062

21 July 2000 Image size control in next generation lithography masks

Michael J. Lercel, Christopher Magg

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390062
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Mask image size variation is a major contributor to the total image size budget. To understand the source and contribution of various errors, we have characterized the image size variations on next generation lithography masks. CD control experiments initiated on x-ray masks are now being extended to other NGL technologies through the application of similar patterns, measurement strategy, and error budget partitioning. A systematic measurement methodology has been used to partition the variations into known components. Long-range variations have been found to be the dominant error, and in x- ray masks, are typically membrane edge effects and cross-mask bow. The membrane effects have been shown to be primarily driven by temperature differences during the post-expose bake (PEB) of the chemically amplified resist. To further understand the source of these temperature variations, the x- ray and SCALPEL mask PEB have been modeled through a finite- difference model. Key contributors to controlling bake temperature uniformity have been identified.

Citation Download Citation

Michael J. Lercel and Christopher Magg "Image size control in next generation lithography masks", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390062

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