Recent Developments In Antireflective - Interference - Layer-Systems

Eckart K. Hussmann; Roland Schnabel

doi:10.1117/12.935486

18 September 1983 Recent Developments In Antireflective - Interference - Layer-Systems

Eckart K. Hussmann, Roland Schnabel

Proceedings Volume 0400, New Optical Materials; (1983) https://doi.org/10.1117/12.935486
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland

Abstract

Two special methods were developed to produce antireflective - interference - layer-systems. One is the dip coating process - an additive method. The other method is the neutral solution process - a substractive method. The antireflective layers from both processes are well suited for high power laser systems. A method is described to measure a refractive index gradient in thin layers - as for example leached layers.

Citation Download Citation

Eckart K. Hussmann and Roland Schnabel "Recent Developments In Antireflective - Interference - Layer-Systems", Proc. SPIE 0400, New Optical Materials, (18 September 1983); https://doi.org/10.1117/12.935486

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available