Paper
5 July 2000 Modeling the effects of excimer laser bandwidths on lithographic performance
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Abstract
In many respects, excimer lasers are almost ideal light sources for optical lithography applications. Their narrow bandwidth and high power provide tow of the main characteristics required of a light source for high- resolution imaging. However, for deep-UV lithography projection tools with no chromatic aberration in the imaging lens, even the very narrow bandwidth of an excimer laser may lead to image degradation.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Armen Kroyan, Joseph J. Bendik, Olivier Semprez, Nigel R. Farrar, Christopher G. Rowan, and Chris A. Mack "Modeling the effects of excimer laser bandwidths on lithographic performance", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389057
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CITATIONS
Cited by 23 scholarly publications and 7 patents.
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KEYWORDS
Chromatic aberrations

Lithography

Excimer lasers

Light sources

Optical simulations

Chlorine

Critical dimension metrology

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