New pattern generation system based on i-line stepper: photomask repeater

Suigen Kyoh; Soichi Inoue; Iwao Higashikawa; Ichiro Mori; Katsuya Okumura; Nobuyuki Irie; Koji Muramatsu; Nobutaka Magome

doi:10.1117/12.389056

5 July 2000 New pattern generation system based on i-line stepper: photomask repeater

Suigen Kyoh, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Nobutaka Magome

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389056
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

New pattern generation system, Photomask Repeater, based on i-line stepper has been developed. This system can transfer device patterns from master masks onto a photomask plate with 22mm field size. To print a chip larger than the 22mm field, stitching technology has been developed. Critical dimension error in the region where shots are stitched is the key issue of this technology. Quantification of critical dimension deviation induced by shot misplacement was carried out by calculation. Introducing exposure dose gradation, it was reduced less than 1.5nm. Form measurements of real exposed mask this technique proved to be able to stitch shots seamlessly. Major two specifications, pattern placement accuracy and critical dimension uniformity, were evaluated. Both specifications required for 150nm photomask were fully satisfied. Availability of the photomask repeater to memory device and system on chip is discussed.

Citation Download Citation

Suigen Kyoh, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, and Nobutaka Magome "New pattern generation system based on i-line stepper: photomask repeater", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389056

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