Paper
29 December 1999 Generation of Gauss-Hermite modes using binary DOEs
Svetlana N. Khonina, Victor V. Kotlyar, Victor A. Soifer, Jari Lautanen, Marko Honkanen, Jari Pekka Turunen
Author Affiliations +
Proceedings Volume 4016, Photonics, Devices, and Systems; (1999) https://doi.org/10.1117/12.373630
Event: Photonics Prague '99, 1999, Prague, Czech Republic
Abstract
We present the following results. Using an e-beam lithography we fabricate don a quartz substrate binary DOEs for the effective formation of individual Gauss-Hermite modes, (1,0), (1,1), (1,2) and (7,0). The transmission function of such DOEs is found to equal the signum function of the Hermite polynomial. Numerical simulation has shown that the binary signum DOEs are capable of generating first GH modes with a 64-72 percent efficiency. In real experiments such DOEs operate in agreement with theory and with satisfactory efficiency.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Svetlana N. Khonina, Victor V. Kotlyar, Victor A. Soifer, Jari Lautanen, Marko Honkanen, and Jari Pekka Turunen "Generation of Gauss-Hermite modes using binary DOEs", Proc. SPIE 4016, Photonics, Devices, and Systems, (29 December 1999); https://doi.org/10.1117/12.373630
Lens.org Logo
CITATIONS
Cited by 8 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Binary data

Diffractive optical elements

Far-field diffraction

Photomasks

Electron beam lithography

Diffraction

Numerical simulations

RELATED CONTENT

Femtosecond laser ablation of Cr-SiO2 binary mask
Proceedings of SPIE (February 19 2003)
Study of mask structure for 45 nm node based on...
Proceedings of SPIE (May 14 2007)
Potential of e-beam writing for diffractive optics
Proceedings of SPIE (May 15 1997)
Advanced hybrid mask process development
Proceedings of SPIE (May 20 2006)

Back to Top