High-energy femtosecond oscillators and their application for laser ablation of dielectric materials

Vladislav V. Yakovlev

doi:10.1117/12.407394

16 August 2000 High-energy femtosecond oscillators and their application for laser ablation of dielectric materials

Vladislav V. Yakovlev

Proceedings Volume 4065, High-Power Laser Ablation III; (2000) https://doi.org/10.1117/12.407394
Event: High-Power Laser Ablation, 2000, Santa Fe, NM, United States

Abstract

High-energy oscillators, generating femtosecond pulses at 800 nm and 1250 nm, are demonstrated. These pulses are used for fast-speed laser ablation and material modification of transparent dielectric materials. Sub-micron size features are produced in fused silica by tight focusing of these pulses.

Citation Download Citation

Vladislav V. Yakovlev "High-energy femtosecond oscillators and their application for laser ablation of dielectric materials", Proc. SPIE 4065, High-Power Laser Ablation III, (16 August 2000); https://doi.org/10.1117/12.407394

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available