DUV/VUV light scattering measurement of optical components for lithography applications

Stefan Gliech; Joerg Steinert; Marcel Flemming; Angela Duparre

doi:10.1117/12.405807

2 November 2000 DUV/VUV light scattering measurement of optical components for lithography applications

Stefan Gliech, Joerg Steinert, Marcel Flemming, Angela Duparre

Proceedings Volume 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries; (2000) https://doi.org/10.1117/12.405807
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

This paper reports on an instrument designed to measure the total backward and forward scattering of optical components down to the DUV/VUV spectral region. The system is based on a Coblentz sphere imaging the light scattered into the backward or forward hemispheres within an angular range from 2 degree(s) to 85 degree(s) onto the detector according to ISO/DIS 13696. The equipment divides into two set-ups, one operating in air at several wavelengths from 10.6 micrometers to 193 nm, the other one working in a vacuum/nitrogen at 157 nm and 193 nm. The system is fully automated and capable of scanning large sample areas. Both a deuterium lamp and an excimer laser can be used as radiation sources at 193 nm and 157 nm. Results of measurements on fluoride multilayer coatings and CaF₂ substrates are presented.

Citation Download Citation

Stefan Gliech, Joerg Steinert, Marcel Flemming, and Angela Duparre "DUV/VUV light scattering measurement of optical components for lithography applications", Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); https://doi.org/10.1117/12.405807

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