Microroughness analysis of thin film components for VUV applications

Josep Ferre-Borrull; Angela Duparre; Joerg Steinert; Detlev Ristau; Etienne Quesnel

doi:10.1117/12.405810

2 November 2000 Microroughness analysis of thin film components for VUV applications

Josep Ferre-Borrull, Angela Duparre, Joerg Steinert, Detlev Ristau, Etienne Quesnel

Proceedings Volume 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries; (2000) https://doi.org/10.1117/12.405810
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

For the roughness characterization of optical surfaces a new procedure based on the analysis of their power spectral density (PSD) functions has been developed. The method consists of the fitting of the PSD obtained from Atomic Force Microscopy measurements at different scan sizes to mathematical models. With this procedure the micro- structural properties of optical surfaces and coatings can be represented by a reduced set of numbers that correspond to the characteristic parameters of the mathematical models. For optical coatings this method allows a separate study of the influence of the substrate and layers on the overall sample roughness. As an example, the method is applied to MgF₂ and LaF₃ films for VUV applications. We investigated a set of single layers deposited onto superpolished Caf₂, fused silica and Si substrates. The samples were deposited by ion beam sputtering, boat and e- beam evaporation. A comparison of the influence of the substrate on the development of the roughnesses and lateral structures has been performed, as well as a study of the dependence of the roughness properties of the coatings on the deposition process. Complementary investigations of roughness-related scattering consisting of measurements of Total Scatter at 193 nm and 633 nm and calculation of expected scattering based on the theory are presented.

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Josep Ferre-Borrull, Angela Duparre, Joerg Steinert, Detlev Ristau, and Etienne Quesnel "Microroughness analysis of thin film components for VUV applications", Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); https://doi.org/10.1117/12.405810

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KEYWORDS

Magnesium fluoride

Spatial frequencies

Scattering

Silicon

Silica

Atomic force microscopy

Optical coatings

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