Long-term test and characterization of optical components at 193 nm and 157 nm

Klaus Vogler; Ingo Klaft; Thomas Schroeder; Uwe Stamm; Klaus R. Mann; Oliver Apel; Christian Goerling; Uwe Leinhos

doi:10.1117/12.405292

25 October 2000 Long-term test and characterization of optical components at 193 nm and 157 nm

Klaus Vogler, Ingo Klaft, Thomas Schroeder, Uwe Stamm, Klaus R. Mann, Oliver Apel, Christian Goerling, Uwe Leinhos

Proceedings Volume 4102, Inorganic Optical Materials II; (2000) https://doi.org/10.1117/12.405292
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

We have investigated bulk and coated optical elements as well as UV detectors and CCD cameras in long term exposure experiments using 193 nm and 157 nm continuously pulsed laser irradiation at high fluence levels up to 10 mJ/cm² and at repetition rates of 1 kHz. The irradiation is performed in nitrogen purged exposure chambers. The samples accumulate several billion of laser shots up to total dose values above 100 kJ/cm². In this report we present some recent results on optical elements and UV- detectors each of several different suppliers which are illuminated by more than 2.4 billion shots of 157 nm laser radiation. The original and final properties are compared.

Citation Download Citation

Klaus Vogler, Ingo Klaft, Thomas Schroeder, Uwe Stamm, Klaus R. Mann, Oliver Apel, Christian Goerling, and Uwe Leinhos "Long-term test and characterization of optical components at 193 nm and 157 nm", Proc. SPIE 4102, Inorganic Optical Materials II, (25 October 2000); https://doi.org/10.1117/12.405292

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