Stigmatic EUV spectroscopic system for emission and absorption studies of laser-produced plasmas

Luca Poletto; Piergiorgio Nicolosi; Giuseppe Tondello

doi:10.1117/12.410545

18 December 2000 Stigmatic EUV spectroscopic system for emission and absorption studies of laser-produced plasmas

Luca Poletto, Piergiorgio Nicolosi, Giuseppe Tondello

Proceedings Volume 4139, Instrumentation for UV/EUV Astronomy and Solar Missions; (2000) https://doi.org/10.1117/12.410545
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

The optical design of a stigmatic spectroscopic system for diagnostic of laser-produced plasmas in the 2.5 - 40 nm region is presented. The system consists of a grazing-incidence toroidal mirror which focuses the radiation emitted by a laser-produced plasma on the entrance slit of a spectrograph. The latter has a spherical variable-line-spaced grating with flat-field properties coupled to a spherical focusing mirror that compensates for the astigmatism. The mirror is crossed with respect to the grating, i.e. it is mounted with its tangential plane coincident with the equatorial plane of the grating. The spectrum is acquired by an EUV-enhanced CCD detector with high quantum efficiency. This stigmatic design has also spectral and spatial resolution capability for extended sources: the spectral resolution is independent from the size of the source while the spatial resolution decreases for sources far from the optical axis. The expected performances are presented and compared with those of a conventional stigmatic design with a plane variable-line- spaced grating.

Citation Download Citation

Luca Poletto, Piergiorgio Nicolosi, and Giuseppe Tondello "Stigmatic EUV spectroscopic system for emission and absorption studies of laser-produced plasmas", Proc. SPIE 4139, Instrumentation for UV/EUV Astronomy and Solar Missions, (18 December 2000); https://doi.org/10.1117/12.410545

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