Paper
8 November 2000 Portable diagnostics for EUV light sources
R. Stuik, Raluca C. Constantinescu, Petra Hegeman, Jeroen Jonkers, H. F. Fledderus, Vadim Banine, Fred Bijkerk
Author Affiliations +
Abstract
The EUV light source is a critical factor for the success of Extreme Ultraviolet Lithography (EULV), ASML, FOM and Philips Research have developed a portable set of diagnostics for the characterization of candidate EUV sources, called Flying Circus. The set of diagnostics is used to perform the following measurements: Absolute EUV power measurements, pulse-to-pulse intensity fluctuations, plasma size and shape, size/shape/positional stability, spectral distribution of radiation and stability, timing jitter and contamination by the source. These measurements are to be performed on-site, at the laboratories of the different source developers. The design as well as the first calibration measurements performed by the Flying Circus on the FOM Xe double gas jet source and on the PLEX z-pinch source will be discussed.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Stuik, Raluca C. Constantinescu, Petra Hegeman, Jeroen Jonkers, H. F. Fledderus, Vadim Banine, and Fred Bijkerk "Portable diagnostics for EUV light sources", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406663
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Cited by 23 scholarly publications.
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KEYWORDS
Extreme ultraviolet

Diagnostics

Plasma

Coded apertures

Mirrors

Spectroscopy

Calibration

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