Evaluation of a multiple-beam defect inspection platform using an integrated reference mask

Jerry Xiaoming Chen; Franklin D. Kalk; Anthony Vacca; Scott Pomeroy; Jordan Carroll

doi:10.1117/12.410744

22 January 2001 Evaluation of a multiple-beam defect inspection platform using an integrated reference mask

Jerry Xiaoming Chen, Franklin D. Kalk, Anthony Vacca, Scott Pomeroy, Jordan Carroll

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410744
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

Many inspection tools generate massive false defects in the presence of radical OPC decorations or sub spec line widths causing system aborts and retries. We have defined the inspectivity (or runability) of a tool as the ability to complete inspections in the presence of challenging geometry, while still maintaining high defect sensitivity. A new UV wavelength multiple beam reticle inspection tool has been designed to dramatically reduce inspection time with improved inspectivity. Comprehensive inspection system capability evaluation should include both sensitivity and runability (i.e., ability to inspect various pattern types and sizes). An integrated reference mask was designed previously in order to quantify runability. The mask contains several typical industry feature types at multiple technology nodes. Detailed sensitivity and runability information for two inspection systems has been analyzed and is presented here. The test results provide direction for future improvements by identifying the strengths and weaknesses of inspection systems and their algorithms. In this study we have compared the sensitivity and runability of the KLA-Tencor 365UV-HR to that of the new TeraSTAR™ multiple beam inspection tool.

Citation Download Citation

Jerry Xiaoming Chen, Franklin D. Kalk, Anthony Vacca, Scott Pomeroy, and Jordan Carroll "Evaluation of a multiple-beam defect inspection platform using an integrated reference mask", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410744

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