Paper
29 May 2001 Novel techniques for microscopic imaging of semiconductor surfaces
Author Affiliations +
Abstract
We develop several new optical techniques for microscopic semiconductor diagnostics and use them for inspection of semiconductor surfaces. Short-pulse lasers (femtosecond Ti:sapphire and Cr4+:forsterite) are used for nonlinear optical studies.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladislav V. Yakovlev, Katerina Mikhailichenko, and Sergei V. Govorkov "Novel techniques for microscopic imaging of semiconductor surfaces", Proc. SPIE 4276, Commercial and Biomedical Applications of Ultrashort Pulse Lasers; Laser Plasma Generation and Diagnostics, (29 May 2001); https://doi.org/10.1117/12.428011
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Cited by 1 scholarly publication.
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KEYWORDS
Crystals

Semiconducting wafers

Semiconductors

Confocal microscopy

Silicon

Nonlinear crystals

Diagnostics

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