Use of molecular oxygen to reduce EUV-induced carbon contamination of optics

Michael E. Malinowski; Philip A. Grunow; Chip Steinhaus; W. Miles Clift; Leonard E. Klebanoff

doi:10.1117/12.436677

20 August 2001 Use of molecular oxygen to reduce EUV-induced carbon contamination of optics

Michael E. Malinowski, Philip A. Grunow, Chip Steinhaus, W. Miles Clift, Leonard E. Klebanoff

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436677
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Carbon deposition and removal experiments on Mo/Si multilayer mirror (MLM) samples were performed using extreme ultraviolet (EUV) light on Beamline 12.0.1.2 of the Advanced Light Source, Lawrence Berkeley National Laboratory (LBNL). Carbon (C) was deposited onto Mo/Si multilayer mirror (MLM) samples when hydrocarbon vapors where intentionally introduced into the MLM test chamber in the presence of EUV at 13.44 nm (92.3eV). The carbon deposits so formed were removed by molecular oxygen + EUV. The MLM reflectivities and photoemission were measured in-situ during these carbon deposition and cleaning procedures. Auger Electron Spectroscopy (AES) sputter-through profiling of the samples was performed after experimental runs to help determine C layer thickness and the near-surface compositional-depth profiles of all samples studied. EUV powers were varied from ~0.2mW/mm² to 3mW/mm²(at 13.44 nm) during both deposition and cleaning experiments and the oxygen pressure ranged from ~5x10^-5 to 5x10^-4 Torr during the cleaning experiments. C deposition rates as high as ~8nm/hr were observed, while cleaning rates as high as ~5nm/hr could be achieved when the highest oxygen pressure were used. A limited set of experiments involving intentional oxygen-only exposure of the MLM samples showed that slow oxidation of the MLM surface could occur.

Citation Download Citation

Michael E. Malinowski, Philip A. Grunow, Chip Steinhaus, W. Miles Clift, and Leonard E. Klebanoff "Use of molecular oxygen to reduce EUV-induced carbon contamination of optics", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436677

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