Rational design of bleachable nonchemically amplified DUV photoactive compounds

Benjamen M. Rathsack; Peter I. Tattersall; Cyrus Emil Tabery; Kathleen Lou; Timothy B. Stachowiak; David R. Medeiros; Jeff A. Albelo; Peter Y. Pirogovsky; Dennis R. McKean; C. Grant Willson

doi:10.1117/12.436887

24 August 2001 Rational design of bleachable nonchemically amplified DUV photoactive compounds

Benjamen M. Rathsack, Peter I. Tattersall, Cyrus Emil Tabery, Kathleen Lou, Timothy B. Stachowiak, David R. Medeiros, Jeff A. Albelo, Peter Y. Pirogovsky, Dennis R. McKean, C. Grant Willson

Author Affiliations +

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436887
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Photoactive compounds have been designed, synthesized and characterized for deep ultraviolet non-chemically amplified resist applications. These resist materials may have potential use in next generation 257nm mask fabrication. Mask fabrication requires stringent linewidth specifications over long post-coat and post-exposure bake delays. Lithography simulation and imaging experiments have been done to determine the lithographic performance of resists formulated with these new photoactive compounds. Previously studied chromophores, 7 substituted 3-diazo 4- hydroxycoumarin and N-substituted 3-diazo-2, 4-piperidione, both have the transparency, bleaching and exposure rate kinetics in the DUV that are analogous to those exhibited by the diazonaphthoquinone chromophore at 365nm. The sulfonate linkages attached to these photoactive compounds provide dissolution rate inhibition of novolak that is very similar to the diazonaphthoquinone-sulfonates. The trifunctional diazopiperidione that incorporates three sulfonate linkages provides more efficient inhibition per chromophore than the corresponding bisfunctional photoactive compound. The diazocoumarin based novolak resist demonstrates image reversal (negative tone) with the use of a post-exposure bake. The post-exposure bake causes the exposed photoactive compound to decarboxylate, which dramatically reduces its solubility in aqueous base. The trifunctional diazopiperidione provides the best overall imaging results due to almost complete bleaching and high contrast.

Citation Download Citation

Benjamen M. Rathsack, Peter I. Tattersall, Cyrus Emil Tabery, Kathleen Lou, Timothy B. Stachowiak, David R. Medeiros, Jeff A. Albelo, Peter Y. Pirogovsky, Dennis R. McKean, and C. Grant Willson "Rational design of bleachable nonchemically amplified DUV photoactive compounds", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436887

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available